Tokyo Electron Limited`s Profile
This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.
How does the overall patent portfolio of Tokyo Electron Limited look like?
|Grant Index||76.82 %|
|Abandoned/Rejected Applications:||2106 (23.18%)|
|Average Grant Time:||2.84 Years|
|Average Office Actions:||1.61|
Which Technology Area Tokyo Electron Limited is filing most patents in? (Last 10 years)
|Art Unit||Definition||Total Applications|
|1716||Coating, Etching, Cleaning, Single Crystal Growth||1300|
|1713||Coating, Etching, Cleaning, Single Crystal Growth||799|
|1718||Coating, Etching, Cleaning, Single Crystal Growth||345|
How many patents are Tokyo Electron Limited filing every year?
*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published
Recently filed patent applications of Tokyo Electron Limited in USPTO?
Publication date: 2020-10-29
Applicant: Tokyo Electron Limited
Inventors: Kikuchi Yasuaki
How are Tokyo Electron Limited’s applications performing in USPTO?
|Application Number||Title||Status||Art Unit||Examiner|
|16852478||Film Forming Method And Film Forming Apparatus||Final Rejection Mailed||1715||Miller, Jr, Joseph Albert|