Tokyo Electron Limited`s Profile
This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.
How does the overall patent portfolio of Tokyo Electron Limited look like?
| Total Applications: | 10833 |
| Granted Patents: | 6981 |
| Grant Index | 76.82 % |
| Abandoned/Rejected Applications: | 2106 (23.18%) |
| In-Process Applications: | 1672 |
| Average Grant Time: | 2.84 Years |
| Average Office Actions: | 1.61 |
Which Technology Area Tokyo Electron Limited is filing most patents in? (Last 10 years)
| Art Unit | Definition | Total Applications |
| 1716 | Coating, Etching, Cleaning, Single Crystal Growth | 1300 |
| 1713 | Coating, Etching, Cleaning, Single Crystal Growth | 799 |
| Opap | Parked GAU | 572 |
| 1792 | – | 475 |
| 1718 | Coating, Etching, Cleaning, Single Crystal Growth | 345 |
How many patents are Tokyo Electron Limited filing every year?
| Year | Total Applications |
| 2022 | 1* |
| 2021 | 577* |
| 2020 | 739 |
| 2019 | 644 |
| 2018 | 522 |
*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published
Recently filed patent applications of Tokyo Electron Limited in USPTO?
Publication number: US20200340111A1
Abstract:
A film forming method includes: accommodating a substrate in a processing container of a film forming apparatus; supplying an inert gas to the processing container at a flow rate equal to an average flow rate of a plurality of gases to be supplied into the processing container in a film forming process and maintaining a pressure of the processing container to be substantially same as an average pressure of the processing container in the film forming process; and alternately supplying the plurality of gases into the processing container and forming a film on the substrate.
Publication date: 2020-10-29
Applicant: Tokyo Electron Limited
Inventors: Kikuchi Yasuaki
Abstract:
Publication date: 2020-10-29
Applicant: Tokyo Electron Limited
Inventors: Kikuchi Yasuaki
How are Tokyo Electron Limited’s applications performing in USPTO?
| Application Number | Title | Status | Art Unit | Examiner |
| 16852478 | Film Forming Method And Film Forming Apparatus | Final Rejection Mailed | 1715 | Miller, Jr, Joseph Albert |
