Tokyo Electron Limited Patent Portfolio Statistics
Profile Summary
This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.
How does the overall patent portfolio of Tokyo Electron Limited look like?
Total Applications: | 10,833 |
Granted Patents: | 6,981 |
Grant Index | 76.82 % |
Abandoned/Rejected Applications: | 2,106 (23.18%) |
In-Process Applications: | 1,672 |
Average Grant Time: | 2.84 Years |
Average Office Actions: | 1.61 |
Which Technology Area Tokyo Electron Limited is filing most patents in? (Last 10 years)
Art Unit | Definition | Total Applications |
1716 | Coating, Etching, Cleaning, Single Crystal Growth | 1,300 |
1713 | Coating, Etching, Cleaning, Single Crystal Growth | 799 |
Opap | Parked GAU | 572 |
1792 | – | 475 |
1718 | Coating, Etching, Cleaning, Single Crystal Growth | 345 |
How many patents are Tokyo Electron Limited filing every year?
Year | Total Applications |
2022 | 1* |
2021 | 577* |
2020 | 739 |
2019 | 644 |
2018 | 522 |
*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published
Recently filed patent applications of Tokyo Electron Limited in USPTO?
Application number: 17/498,063
Abstract:
Publication date: 2022-01-27
Applicant: Tokyo Electron Limited
Inventors: Peter Ventzek
Publication number: US20220028665A1
Application number: 17/495,908
Abstract:
Publication date: 2022-01-27
Applicant: Tokyo Electron Limited
Inventors: Himori Shinji
Publication number: US20220020642A1
Application number: 17/487,987
Abstract:
Publication date: 2022-01-20
Applicant: Tokyo Electron Limited
Inventors: Sun Xinghua
How are Tokyo Electron Limited’s applications performing in USPTO?
Application Number | Title | Status | Art Unit | Examiner |
17/498,063 | Broadband Plasma Processing Systems And Methods | – | OPAP | Central, Docket |
17/495,908 | Plasma Processing Method And Plasma Processing Apparatus | – | OPAP | Central, Docket |
17/487,987 | Ald (Atomic Layer Deposition) Liner For Via Profile Control And Related Applications | – | OPAP | Central, Docket |
17/484,914 | Substrate Processing System And Temperature Control Method | – | OPAP | Central, Docket |
17/448,608 | Method Of Manufacturing Semiconductor Device | – | OPAP | Central, Docket |