Raytheon Company Patent Portfolio Statistics

Raytheon Company

Profile Summary

This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.

How does the overall patent portfolio of Raytheon Company look like?

Assignee Art Units
Total Applications: 7,417 2,381,325
Granted Patents: 6,187 1,621,365
Grant Index 90.12% 81.6%
Abandoned/Rejected Applications: 678 (9.88%) 365,487 (18.4%)
In-Process Applications: 519 394,473
Average Grant Time: 2.87 Years 2.52 Years
Average Office Actions: 1.53 1.39

Which Technology Area Raytheon Company is filing most patents in? (Last 10 years)

Art Unit Definition Total Applications
3662 Computerized Vehicle Controls and Navigation, Radio Wave, Optical and Acoustic Wave Communication, Robotics, and Nuclear Systems 377
3641 Aeronautics, Agriculture, Fishing, Trapping, Vermin Destroying, Plant and Animal Husbandry, Weaponry, Nuclear Systems, and License and Review 300
2872 Optics 203
3646 Aeronautics, Agriculture, Fishing, Trapping, Vermin Destroying, Plant and Animal Husbandry, Weaponry, Nuclear Systems, and License and Review 187
2821 185

How many patents are Raytheon Company filing every year?

Year Total Applications Predicted
2022 0* 746
2021 47* 701
2020 360 630
2019 410 410
2018 299
2017 266
2016 303
2015 336
2014 334
2013 344

*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published

Recently filed patent applications of Raytheon Company in USPTO?

Publication number: US20220220331A1
Application number: 17/629,798

This disclosure describes manufacture of a mixture and use of same to fabricate different types of electronic components. In one configuration, the mixture includes: first particles, the first particles being an insulator material; second particles, the second particles being electrically conductive metal material; and a combination of the first particles and the second particles suspended in a printable liquid medium, the printable liquid/solid medium (slurry) being curable into a dielectric layer of material. According to one configuration, the printable material is disposed and cured on a substrate. The first particles and second particles are randomly distributed in the cured printed material (dielectric material). The second particles in the cured dielectric material are transformable into one or more electrically conductive paths, electronic components, etc., via application of heat above a threshold value. Thus, a dielectric (insulator) material can be transformed into an electrically conductive path via application of heat.

Publication date:
Applicant: Raytheon Company
Inventors: Cameron Hardie

Publication number: US20220146786A1
Application number: 17/538,857

A bipod flexure mount couples an optic to a base while isolating the optic from strain to resist wavefront error. The bipod flexure mount has a distal attachment pad to be coupled to the optic and a proximal attachment pad to be coupled to the base. A pair of beams extend between and couple the distal and proximal attachment pads. The distal attachment pad, the proximal attachment pad and the pair of beams are disposed in and define a planar layer with opposite planar surfaces that are substantially parallel. The bipod flexure mount is relatively flexible about four degrees of freedom and is relatively stiff about two degrees of freedom.

Publication date: 2022-05-12
Applicant: Raytheon Company
Inventors: A Kirk Miller

Publication number: US20220082147A1
Application number: 17/539,152

A tuned mass absorber assembly comprises a mass structure, and a flexure system comprising first and second flexure sections (e.g., cross bar flexures) supported by, and extending in opposing directions from, the mass structure. The flexure system can comprise flexure section mounts situated at distal ends of the first and second flexure sections, respectively, and that are operable to mount the tuned mass absorber assembly to a structure subject to induced vibrations therein. A mass of the mass structure and a stiffness of the flexure system can be tuned to attenuate vibrations at a specific input frequency generated in response to induced vibrations of the structure. A system can comprise a vibration isolator attached to a chassis (e.g., of an airplane), and supporting a payload (sensors(s)) and isolating the payload from vibrations. A tuned mass absorber assembly can be mounted to the vibration isolator for attenuating vibrations at a specific input frequency that may affect the payload.

Publication date: 2022-03-17
Applicant: Raytheon Company
Inventors: Martinez Michael

How are Raytheon Company’s applications performing in USPTO?

Application Number Title Status Art Unit Examiner
17/629,798 Printable Mixture, Manufacture, And Use Docketed New Case – Ready for Examination OPAP Central, Docket
17/538,857 2D Bi-Pod Flexure Design, Mount Technique And Process For Implementation Docketed New Case – Ready for Examination OPAP Central, Docket
17/539,152 Tuned Mass Absorber Assembly And System For Attenuating Frequency Specific Vibrational Energy Docketed New Case – Ready for Examination OPAP Central, Docket
17/535,468 Adjustable Optical Mount OPAP Central, Docket
17/612,102 Monitoring Mirror Reflectance Using Solar Illumination Docketed New Case – Ready for Examination OPAP Central, Docket