Noria Corporation Patent Portfolio Statistics
Profile Summary
This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.
How does the overall patent portfolio of Noria Corporation look like?
Total Applications: | 3 |
Granted Patents: | 1 |
Grant Index | 33.33 % |
Abandoned/Rejected Applications: | 2 (66.67%) |
In-Process Applications: | 0 |
Average Grant Time: | 4.36 Years |
Average Office Actions: | 3.0 |
Which Technology Area Noria Corporation is filing most patents in? (Last 10 years)
Art Unit | Definition | Total Applications |
2165 | Data Bases & File Management | 1 |
2833 | Electrical Circuits and Systems | 1 |
3689 | Business Methods – Incentive Programs, Coupons; Electronic Shopping; Business Cryptography, Voting; Health Care; Point of Sale, Inventory, Accounting; Business Processing, Electronic Negotiation | 1 |
How many patents are Noria Corporation filing every year?
Year | Total Applications |
2022 | 0* |
2021 | 0* |
2020 | 0 |
2019 | 0 |
2018 | 0 |
*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published
Recently filed patent applications of Noria Corporation in USPTO?
Application number: 17/498,437
Abstract:
Publication date: 2022-01-27
Applicant: Noria Corporation
Inventors: Benjamin Clark L
Publication number: US20210347791A1
Application number: 17/380,475
Abstract:
Publication date: 2021-11-11
Applicant: Noria Corporation
Inventors: Meyers Stephen T
Publication number: US20210349390A1
Application number: 17/307,223
Abstract:
Publication date: 2021-11-11
Applicant: Noria Corporation
Inventors: Jason K Stowers
How are Noria Corporation’s applications performing in USPTO?
Application Number | Title | Status | Art Unit | Examiner |
17/498,437 | Apparatuses For Reducing Metal Residue In Edge Bead Region From Metal-Containing Resists | – | OPAP | Central, Docket |
17/380,475 | Organotin Clusters, Solutions Of Organotin Clusters, And Application To High Resolution Patterning | Docketed New Case – Ready for Examination | OPAP | Central, Docket |
17/307,223 | Multiple Patterning With Organometallic Photopatternable Layers With Intermediate Freeze Steps | Docketed New Case – Ready for Examination | OPAP | Central, Docket |
17/198,669 | Monoalkyl Tin Compounds With Low Polyalkyl Contamination, Their Compositions And Methods | Docketed New Case – Ready for Examination | OPAP | Central, Docket |
17/188,679 | Process Environment For Inorganic Resist Patterning | Docketed New Case – Ready for Examination | OPAP | Central, Docket |