Kla-Tencor Corporation Patent Portfolio Statistics

Kla-Tencor Corporation

Profile Summary

This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.

How does the overall patent portfolio of Kla-Tencor Corporation look like?

Assignee Art Units
Total Applications: 1,804 1,941,357
Granted Patents: 1,661 1,245,527
Grant Index 95.13% 79.63%
Abandoned/Rejected Applications: 85 (4.87%) 318,554 (20.37%)
In-Process Applications: 57 377,276
Average Grant Time: 2.66 Years 2.6 Years
Average Office Actions: 1.53 1.46

Which Technology Area Kla-Tencor Corporation is filing most patents in? (Last 10 years)

Art Unit Definition Total Applications
2886 Optics 294
2877 Optics 205
2881 Optics 186
2884 Optics 84
2851 Printing/Measuring and Testing 53

How many patents are Kla-Tencor Corporation filing every year?

Year Total Applications Predicted
2022 0* 701
2021 10* 513
2020 18 449
2019 94 94
2018 153
2017 162
2016 222
2015 175
2014 202
2013 169

*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published

Recently filed patent applications of Kla-Tencor Corporation in USPTO?

Publication number: US20220099725A1
Application number: 17/548,255

An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.

Publication date: 2022-03-31
Applicant: Kla-Tencor Corporation
Inventors: Carl Truyens

Publication number: US20220084179A1
Application number: 17/456,415

Disclosed are methods and apparatus for inspecting a photolithographic reticle. A plurality of reference far field images are simulated by inputting a plurality of reference near field images into a physics-based model, and the plurality of reference near field images are generated by a trained deep learning model from a test portion of the design database that was used to fabricate a test area of a test reticle. The test area of a test reticle, which was fabricated from the design database, is inspected for defects via a die-to-database process that includes comparing the plurality of reference far field reticle images simulated by the physic-based model to a plurality of test images acquired by the inspection system from the test area of the test reticle.

Publication date: 2022-03-17
Applicant: Kla-Tencor Corporation
Inventors: Fang Hawren

Publication number: US20220012866A1
Application number: 17/486,213

Common events between layers on a semiconductor wafer are filtered. Common events should contain the majority of defects of interest. Only nuisance events that are common between layers on the semiconductor wafer remain, which reduces the nuisance rate. Defects that are common across layers can be filtered based on, for example, defect coordinates, a difference image, or defect attributes.

Publication date: 2022-01-13
Applicant: Kla-Tencor Corporation
Inventors: Bjorn Brauer

How are Kla-Tencor Corporation’s applications performing in USPTO?

Application Number Title Status Art Unit Examiner
17/548,255 Apparatus, Method And Computer Program Product For Defect Detection In Work Pieces Docketed New Case – Ready for Examination OPAP Central, Docket
17/456,415 Inspection Of Reticles Using Machine Learning Docketed New Case – Ready for Examination OPAP Central, Docket
17/486,213 Cross Layer Common-Unique Analysis For Nuisance Filtering OPAP Central, Docket
17/401,750 Single Cell Grey Scatterometry Overlay Targets And Their Measurement Using Varying Illumination Parameter(S) Docketed New Case – Ready for Examination OPAP Central, Docket
17/241,006 Topographic Phase Control For Overlay Measurement Non Final Action Mailed 2481 Hess, Michael J