Kla-Tencor Corporation Patent Portfolio Statistics

Kla-Tencor Corporation

Profile Summary

This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.

How does the overall patent portfolio of Kla-Tencor Corporation look like?

Total Applications: 1,804
Granted Patents: 1,661
Grant Index 95.13 %
Abandoned/Rejected Applications: 85 (4.87%)
In-Process Applications: 57
Average Grant Time: 2.66 Years
Average Office Actions: 1.53

Which Technology Area Kla-Tencor Corporation is filing most patents in? (Last 10 years)

Art Unit Definition Total Applications
2886 Optics 294
2877 Optics 205
2881 Optics 186
2884 Optics 84
2851 Printing/Measuring and Testing 53

How many patents are Kla-Tencor Corporation filing every year?

Year Total Applications
2022 0*
2021 10*
2020 18
2019 94
2018 153

*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published

Recently filed patent applications of Kla-Tencor Corporation in USPTO?

Publication number: US20220012866A1
Application number: 17/486,213

Common events between layers on a semiconductor wafer are filtered. Common events should contain the majority of defects of interest. Only nuisance events that are common between layers on the semiconductor wafer remain, which reduces the nuisance rate. Defects that are common across layers can be filtered based on, for example, defect coordinates, a difference image, or defect attributes.

Publication date: 2022-01-13
Applicant: Kla-Tencor Corporation
Inventors: Bjorn Brauer

Publication number: US20210373445A1
Application number: 17/401,750

Scatterometry overlay (SCOL) measurement methods, systems and targets are provided to enable efficient SCOL metrology with in-die targets. Methods comprise generating a signal matrix by: illuminating a SCOL target at multiple values of at least one illumination parameter, and at multiple spot locations on the target, wherein the illumination is at a NA (numerical aperture) >⅓ yielding a spot diameter <1μ, measuring interference signals of zeroth and first diffraction orders, and constructing the signal matrix from the measured signals with respect to the illumination parameters and the spot locations on the target; and deriving a target overlay by analyzing the signal matrix. The SCOL targets may be reduced to be a tenth in size with respect to prior art targets, as less and smaller target cells are required, and be easily set in-die to improve the accuracy and fidelity of the metrology measurements.

Publication date: 2021-12-02
Applicant: Kla-Tencor Corporation
Inventors: Amit Eran

Publication number: US20210255551A1
Application number: 17/241,006

Metrology tools and methods are provided, which estimate the effect of topographic phases corresponding to different diffraction orders, which result from light scattering on periodic targets, and adjust the measurement conditions to improve measurement accuracy. In imaging, overlay error magnification may be reduced by choosing appropriate measurement conditions based on analysis of contrast function behavior, changing illumination conditions (reducing spectrum width and illumination NA), using polarizing targets and/or optical systems, using multiple defocusing positions etc. On-the-fly calibration of measurement results may be carried out in imaging or scatterometry using additional measurements or additional target cells.

Publication date: 2021-08-19
Applicant: Kla-Tencor Corporation
Inventors: Levinski Vladimir

How are Kla-Tencor Corporation’s applications performing in USPTO?

Application Number Title Status Art Unit Examiner
17/486,213 Cross Layer Common-Unique Analysis For Nuisance Filtering OPAP Central, Docket
17/401,750 Single Cell Grey Scatterometry Overlay Targets And Their Measurement Using Varying Illumination Parameter(S) Docketed New Case – Ready for Examination OPAP Central, Docket
17/241,006 Topographic Phase Control For Overlay Measurement Docketed New Case – Ready for Examination 2481 Hess, Michael J
17/179,379 Accuracy Improvements In Optical Metrology Docketed New Case – Ready for Examination OPAP Central, Docket
17/163,904 Measurement Of Overlay Error Using Device Inspection System Docketed New Case – Ready for Examination OPAP Central, Docket