Hitachi High-Technologies Corporation Patent Portfolio Statistics

Publication number: US20210405079A1
Application number: 17/474,586

Abstract:
An automated analyzer includes two or more types of photometers to obtain suitable output of the measurement results of the plurality of photometers and suitable data alarm output even if there is an abnormality, or the like, at the time of measurement. The automated analyzer includes, for example, two types of photometers having different quantitative ranges and an analysis control unit for controlling analysis that includes measurement of a given sample using the two types of photometers. If two types of data alarms corresponding to abnormalities, or the like, during measurement have been added to the two types of measurement results from the two types of photometers, the analysis control unit selects measurement result and data alarm output corresponding to the combination of the two types of data alarms and outputs the same to a user as analysis results.

Publication date: 2021-12-30
Applicant: Hitachi High-Technologies Corporation
Inventors: Iijima Masahiko

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Publication number: US20210398770A1
Application number: 17/462,455

Abstract:
An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

Publication date: 2021-12-23
Applicant: Hitachi High-Technologies Corporation
Inventors: Kawamoto Yuta

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Publication number: US20210383524A1
Application number: 17/410,344

Abstract:
A pattern inspection system inspects an image of an inspection target pattern of an electronic device using an identifier constituted by machine learning, based on the image of the inspection target pattern of the electronic device and data used to manufacture the inspection target pattern. The system includes a storage unit which stores a plurality of pattern images of the electronic device and pattern data used to manufacture a pattern of the electronic device, and an image selection unit which selects a learning pattern image used in the machine learning from the plurality of pattern images, based on the pattern data and the pattern image stored in the storage unit.

Publication date: 2021-12-09
Applicant: Hitachi High-Technologies Corporation
Inventors: Toyoda Yasutaka

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