Hamamatsu Photonics K.K Patent Portfolio Statistics

Hamamatsu Photonics K.K.

Profile Summary

This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.

How does the overall patent portfolio of Hamamatsu Photonics K.K. look like?

Assignee Art Units
Total Applications: 2,288 2,166,396
Granted Patents: 1,754 1,377,242
Grant Index 89.54% 77.94%
Abandoned/Rejected Applications: 205 (10.46%) 389,733 (22.06%)
In-Process Applications: 320 399,421
Average Grant Time: 2.53 Years 2.6 Years
Average Office Actions: 1.26 1.51

Which Technology Area Hamamatsu Photonics K.K. is filing most patents in? (Last 10 years)

Art Unit Definition Total Applications
2884 Optics 242
2878 Optics 171
Opap Parked GAU 165
2872 Optics 132
2877 Optics 116

How many patents are Hamamatsu Photonics K.K. filing every year?

Year Total Applications Predicted
2022 0* 592
2021 151* 567
2020 187 483
2019 183 183
2018 127
2017 120
2016 121
2015 143
2014 83
2013 83

*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published

Recently filed patent applications of Hamamatsu Photonics K.K. in USPTO?

Publication number: US20220102126A1
Application number: 17/549,113

Abstract:
A sample support body is a sample support body for ionizing a sample, including: a substrate having an irregular porous structure formed to communicate a first surface and a second surface opposite to each other; and a conductive layer provided at least on the first surface.

Publication date: 2022-03-31
Applicant: Hamamatsu Photonics K.K.
Inventors: Ikeda Takamasa


Publication number: US20220238775A1
Application number: 17/615,159

Abstract:
In a method for making a light-emitting device, a plurality of windows (20) on which light source (10) are mounted is prepared, an block (AG1) in which a plurality of packages (30) are connected in an array is prepared, the window (20) is mounted in each package (30) of the block (AG1) to electrically connect a first pad (25) and a second pad (36) corresponding to each other, and the block (AG1) is separated to obtain the plurality of packages (30) on which the corresponding window (20) are mounted.

Publication date:
Applicant: Hamamatsu Photonics K.K.
Inventors: Okuyama Yoshihiro


Publication number: US20220084827A1
Application number: 17/534,835

Abstract:
A laminated element manufacturing method includes a first forming step of forming a first modified region along a line to cut by irradiating a semiconductor substrate of a first wafer with a laser light along the line to cut, a first grinding step of grinding the semiconductor substrate of the first wafer, a bonding step of bonding a circuit layer of a second wafer to the semiconductor substrate of the first wafer, a second forming step of forming a second modified region along the line to cut by irradiating a semiconductor substrate of the second wafer with a laser light along the line to cut, and a second grinding step of grinding the semiconductor substrate of the second wafer.

Publication date: 2022-03-17
Applicant: Hamamatsu Photonics K.K.
Inventors: Ryuji Sugiura


How are Hamamatsu Photonics K.K.’s applications performing in USPTO?

Application Number Title Status Art Unit Examiner
17/549,113 Sample Support Docketed New Case – Ready for Examination OPAP Central, Docket
17/615,159 Light-Emitting Device And Method For Manufacturing Light-Emitting Device Docketed New Case – Ready for Examination OPAP Central, Docket
17/534,835 Laminated Element Manufacturing Method Docketed New Case – Ready for Examination OPAP Central, Docket
17/608,857 Method For Inspecting Semiconductor And Semiconductor Inspecting Device Sent to Classification contractor
17/608,833 Semiconductor Inspection Device And Semiconductor Inspection Method Sent to Classification contractor