Asml Netherlands B.V Patent Portfolio Statistics

Asml Netherlands B.V.

Profile Summary

This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.

How does the overall patent portfolio of Asml Netherlands B.V. look like?

Assignee Art Units
Total Applications: 5,688 2,170,158
Granted Patents: 4,628 1,399,348
Grant Index 91.84% 78.55%
Abandoned/Rejected Applications: 411 (8.16%) 382,015 (21.45%)
In-Process Applications: 639 388,795
Average Grant Time: 2.81 Years 2.58 Years
Average Office Actions: 1.76 1.45

Which Technology Area Asml Netherlands B.V. is filing most patents in? (Last 10 years)

Art Unit Definition Total Applications
2882 Optics 2,024
2851 Printing/Measuring and Testing 885
2881 Optics 686
2886 Optics 215
2877 Optics 152

How many patents are Asml Netherlands B.V. filing every year?

Year Total Applications Predicted
2022 0* 739
2021 187* 749
2020 232 721
2019 321 321
2018 289
2017 250
2016 232
2015 219
2014 232
2013 122

*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published

Recently filed patent applications of Asml Netherlands B.V. in USPTO?

Publication number: US20210041788A1
Application number: 16/965,130

A method for inspection of a patterning device. The method includes obtaining (i) patterning device apparatus data of a patterning device making process, (ii) a patterning device substrate map based on the patterning device apparatus data, and (iii) predicted process window limiting pattern locations corresponding to the patterning device based on the patterning device substrate map, and based on the process window limiting pattern locations, guiding a patterning device inspection apparatus to the process window limiting pattern locations for defect inspection.

Publication date: 2021-02-11
Applicant: Asml Netherlands B.V.
Inventors: Vaenkatesan Vidya

Publication number: US20190212664A1
Application number: 16/352,907

A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first height map component represents topographical variations associated with the device pattern. One or more further height map components represent other topographical variations. Using each height map component, control set-points are calculated according to a control algorithm specific to each component. The control set-points calculated for the different height map components are then combined and used to control imaging of the device pattern to the substrate. The specific control algorithms can be different from one another, and may have differing degrees of nonlinearity. The combining of the different set-points can be linear. Focus control in the presence of device-specific topography and other local variations can be improved.

Publication date: 2019-07-11
Applicant: Asml Netherlands B.V.
Inventors: Erik Johan Koop

Publication number: US20190212655A1
Application number: 16/279,001

A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

Publication date: 2019-07-11
Applicant: Asml Netherlands B.V.
Inventors: Der Post Sietse Thijmen Van

How are Asml Netherlands B.V.’s applications performing in USPTO?

Application Number Title Status Art Unit Examiner
16/965,130 Guided Patterning Device Inspection Patented Case 2882 Riddle, Christina A
16/352,907 Methods For Controlling Lithographic Apparatus, Lithographic Apparatus And Device Manufacturing Method Patented Case 2882 Nguyen, Hung
16/279,001 Method And Apparatus For Inspection And Metrology Patented Case 2882 Riddle, Christina A
16/270,958 Lithographic Apparatus And Method Patented Case 2882 Whitesell Gordon, Steven H
16/268,564 Method And Apparatus For Measuring A Parameter Of Interest Using Image Plane Detection Techniques Patented Case 2886 Stock Jr, Gordon J