Applied Materials, Inc Patent Portfolio Statistics

Applied Materials, Inc.

Profile Summary

This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.

How does the overall patent portfolio of Applied Materials, Inc. look like?

Total Applications: 14,652
Granted Patents: 9,209
Grant Index 72.49 %
Abandoned/Rejected Applications: 3,495 (27.51%)
In-Process Applications: 1,874
Average Grant Time: 2.81 Years
Average Office Actions: 1.73

Which Technology Area Applied Materials, Inc. is filing most patents in? (Last 10 years)

Art Unit Definition Total Applications
1716 Coating, Etching, Cleaning, Single Crystal Growth 1,248
3723 Manufacturing Devices & Processes, Machine Tools & Hand Tools 746
Opap Parked GAU 553
1713 Coating, Etching, Cleaning, Single Crystal Growth 543
1763 Oraganic Chemistry, Polymers, Compositions 529

How many patents are Applied Materials, Inc. filing every year?

Year Total Applications
2022 0*
2021 395*
2020 1,045
2019 933
2018 679

*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published

Recently filed patent applications of Applied Materials, Inc. in USPTO?

Publication number: US20220028793A1
Application number: 17/498,247

Abstract:
Apparatuses and methods to provide electronic devices having metal films are provided. Some embodiments of the disclosure utilize a metallic tungsten layer as a liner that is filled with a metal film comprising cobalt. The metallic tungsten layer has good adhesion to the cobalt leading to enhanced cobalt gap-fill performance.

Publication date: 2022-01-27
Applicant: Applied Materials, Inc.
Inventors: Xu Yi


Publication number: US20220028660A1
Application number: 17/498,231

Abstract:
Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.

Publication date: 2022-01-27
Applicant: Applied Materials, Inc.
Inventors: Kenichi Ohno


Publication number: US20220028702A1
Application number: 17/498,129

Abstract:
Describes are shutter disks comprising one or more of titanium (Ti), barium (Ba), or cerium (Ce) for physical vapor deposition (PVD) that allows pasting to minimize outgassing and control defects during etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including O2, CO, CO2, and water.

Publication date: 2022-01-27
Applicant: Applied Materials, Inc.
Inventors: Babu Sarath


How are Applied Materials, Inc.’s applications performing in USPTO?

Application Number Title Status Art Unit Examiner
17/498,247 Deposition Of Metal Films With Tungsten Liner OPAP Central, Docket
17/498,231 Methods And Systems To Modulate Film Stress OPAP Central, Docket
17/498,129 Shutter Disk OPAP Central, Docket
17/494,631 Window In Thin Polishing Pad OPAP Central, Docket
17/494,600 Stretchable Polymer And Dielectric Layers For Electronic Displays OPAP Central, Docket