Applied Materials, Inc Patent Portfolio Statistics

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Applied Materials, Inc.

Profile Summary

This article summarizes the perfomance of the assignee in the recent years. The overall statistics for this portfolio help to analyze the areas where the assignee is performing well. The filing trend, perfomance across the tech centers and the perfomance of the recent applications has been mentioned below. All the stats are calculated based on the perfomance in USPTO.

How does the overall patent portfolio of Applied Materials, Inc. look like?

Assignee Art Units
Total Applications: 14,652 2,281,142
Granted Patents: 9,209 1,474,446
Grant Index 72.49% ↓ 78.01%
Abandoned/Rejected Applications: 3,495 (27.51%) 415,648 (21.99%)
In-Process Applications: 1,874 391,048
Average Grant Time: 2.81 Years ↑ 2.54 Years
Average Office Actions: 1.73 ↑ 1.47

Which Technology Area Applied Materials, Inc. is filing most patents in? (Last 10 years)

Art Unit Definition Total Applications
1716 Coating, Etching, Cleaning, Single Crystal Growth 1,248
3723 Manufacturing Devices & Processes, Machine Tools & Hand Tools 746
Opap Parked GAU 553
1713 Coating, Etching, Cleaning, Single Crystal Growth 543
1763 Oraganic Chemistry, Polymers, Compositions 529

How many patents are Applied Materials, Inc. filing every year?

Year Total Applications Predicted
2022 0* 1463
2021 395* 1462
2020 1,045 1216
2019 933 933
2018 679 –
2017 746 –
2016 557 –
2015 526 –
2014 745 –
2013 623 –

*The drop in the number of applications filed in last two years compared to previous years is because applications can take up to 18 months to get published

Recently filed patent applications of Applied Materials, Inc. in USPTO?

Publication number: US20220106679A1
Application number: 17/552,505

Abstract:
A deposition system, and a method of operation thereof are disclosed. The deposition system comprises a cathode assembly comprising a rotating magnet assembly including a plurality of outer peripheral magnets surrounding an inner peripheral magnet.

Publication date: 2022-04-07
Applicant: Applied Materials, Inc.
Inventors: Jindal Vibhu

Publication number: US20220107558A1
Application number: 17/552,513

Abstract:
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.

Publication date: 2022-04-07
Applicant: Applied Materials, Inc.
Inventors: Jindal Vibhu

Publication number: US20220108728A1
Application number: 17/551,538

Abstract:
Memory devices are described. The memory devices include a plurality of bit lines extending through a stack of alternating memory layers and dielectric layers. Each of the memory layers comprises a single crystalline-like silicon layer and includes a first word line, a second word line, a first capacitor, and a second capacitor. Methods of forming stacked memory devices are also described.

Publication date: 2022-04-07
Applicant: Applied Materials, Inc.
Inventors: Kang Sung-Kwan

How are Applied Materials, Inc.’s applications performing in USPTO?

Application Number Title Status Art Unit Examiner
17/552,505 Deposition System With A Multi-Cathode Docketed New Case – Ready for Examination OPAP Central, Docket
17/552,513 Physical Vapor Deposition System And Processes Docketed New Case – Ready for Examination OPAP Central, Docket
17/551,538 3D Dram Structure With High Mobility Channel Docketed New Case – Ready for Examination OPAP Central, Docket
17/545,554 Patterning Of Multi-Depth Optical Devices Docketed New Case – Ready for Examination OPAP Central, Docket
17/544,358 Liquid Lithium Supply And Regulation Docketed New Case – Ready for Examination OPAP Central, Docket